Elsevier S & T

Advances in Plasma-Grown Hydrogenated Films

Agranovich, V. M.

In stock
No reviews
77.750 KD inc. VAT
License
Table of contents
  • Cover
  • Contentsv
  • Contributorsvii
  • Prefaceix
  • Chapter 1. Methods of Deposition of Hydrogenated Amorphous Silicon for Device Applications1
  • 1.1. Introduction1
  • 1.2. Research and Industrial Equipment15
  • 1.3. Physics and Chemistry of PECVD27
  • 1.4. Plasma Modeling41
  • 1.5. Plasma Analysis79
  • 1.6. Relation between Plasma Parameters and Material Properties108
  • 1.7. Deposition Models129
  • 1.8. Modifications of PECVD139
  • 1.9. Hot Wire Chemical Vapor Deposition157
  • 1.10. Expanding Thermal Plasma Chemical Vapor Deposition163
  • 1.11. Applications169
  • 1.12. Conclusion189
  • Acknowledgments190
  • References191
  • Chapter 2. Growth, Structure, and Properties of Plasma-Deposited Amorphous Hydrogenated Carbon–Nit217
  • 2.1. Introduction217
  • 2.2. Amorphous Hydrogenated Carbon Films219
  • 2.3. Nitrogen Incorporation Into a-C:H Films227
  • 2.4. Characterization of a-C(N):H Film Structure246
  • 2.5. Mechanical Properties263
  • 2.6. Optical and Electrical Properties267
  • References272
  • Index277
Book details
  • Vendor Elsevier S & T
  • SKU 9780125330305
  • ISBN-13 9780080542874
  • Author Agranovich, V. M.
  • Category Technology & Engineering
  • Subject Materials Science

Do you have questions about this book?

Ask an expert!

Description eBook delivery & access Reviews
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects.

Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new title
reflects more accurately the rapidly growing inclusion of research and
development efforts on nanostructures, especially in relation to novel
solid-state device formats