Elsevier S & T

Non-Crystalline Films for Device Structures

Rossnagel, Stephen M.

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Table of contents
  • Cover
  • Contentsv
  • Contributorsvii
  • Prefaceix
  • Chapter 1. Ultrathin Gate Dielectric Films for Si-Based Microelectronic Devices1
  • 1.1. Introduction1
  • 1.2. Requirements of Ultrathin Gate Dielectric Films6
  • 1.3. Ultrathin Gate Dielectric Film Processing6
  • 1.4. Characterization of Ultrathin Gate Dielectric Films16
  • 1.5. Hydrogen and Ultrathin Gate Dielectric Films45
  • 1.6. Silicon Oxide Gate Dielectric Films52
  • 1.7. Silicon Oxynitride Gate Dielectric Films82
  • 1.8. Alternative (High-k) Gate Dielectric Films104
  • 1.9. Final Remarks122
  • Acknowledgments122
  • References123
  • Chapter 2. Electrochemical Passivation of Si and SiGe Surfaces135
  • 2.1. Introduction135
  • 2.2. In Situ Characterization of Surface Bond Configurations and Electronic Surface States137
  • 2.3. Electrochemically Hydrogenated Si Surfaces159
  • 2.4. Hydrogenated Porous Silicon182
  • 2.5. Thin Anodic Oxides on Si200
  • 2.6. Thick Anodic Oxides on Si224
  • 2.7. Enhanced Passivation of SiGe by Anodic Oxidation233
  • Acknowledgments249
  • References249
  • Index261
  • Recent Volumes In This Series267
Book details
  • Vendor Elsevier S & T
  • SKU 9780125330299
  • ISBN-13 9780080542959
  • Author Rossnagel, Stephen M.
  • Category Technology & Engineering
  • Subject Materials Science

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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects.

Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4).
The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.