Plasma Deposition of Amorphous Silicon-Based Materials
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Table of contents
- Plasma Deposition of Amorphous Silicon-Based Materialsiii
- Copyright Pageiv
- Contentsv
- Contributorsix
- Prefacexi
- Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspec1
- I. Introduction1
- II. Some Fundamentals on Plasma Deposition4
- III. Chemical Systems for Amorphous Silicon and Its Alloys26
- IV. Effect of Novel Parameters36
- V. Deposition Mechanisms and Controversial Aspects52
- References57
- Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes63
- I. Introduction64
- II. Optical Diagnostics65
- III. Mass Spectrometry and Langmuir Probes82
- IV. In Situ Studies of the Growth of a-Si:H by Spectroellipsometry102
- References125
- Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys131
- I. Introduction131
- II. General Comments on Amorphous Alloy Growth133
- III. Relationship between Mobility and Device Performance157
- IV. Concepts of Electronic Transport in Amorphous Semiconductors170
- V. Summary and Conclusions172
- References173
- Chapter 4. Reactor Design for a-Si:H Deposition177
- I. Introduction177
- II. Power Dissipation Mechanisms in SiH4 Discharges179
- III. Material Balance and Gas-Phase and Surface Physicochemistry193
- IV. Concepts of Reactors for a-Si:H Deposition213
- V. Summary and Conclusions235
- References237
- Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor243
- I. Introduction243
- II. Effect on Properties of a-SiH Due to Parametric Variations Using the PECVD Technique247
- III. Alternative Deposition Techniques271
- IV. Surface States, Interface States, and Their Effect on Device Performance272
- V. Summary280
- References280
- Chapter 6. Amorphous-Silicon-Based Devices283
- I. Introduction283
- II. Significant Advantages of a-Si in Its Alloys as a New Optoelectronic Material284
- III. Progress in Amorphous Silicon Solar Cell Technology294
- IV. Integrated Photosensor and Color Sensor303
- V. Aspect of a-Si Imaging Device Applications307
- VI. a-Si Electrophotographic Applications308
- VII. Visible-Light Thin-Film Light-Emitting Diode (TFLED)309
- References312
- Index315
- Plasma–Materials Interactions325
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.
Key Features
* Focuses on the plasma chemistry of amorphous silicon-based materials
* Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced
* Features an international group of contributors
* Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Key Features
* Focuses on the plasma chemistry of amorphous silicon-based materials
* Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced
* Features an international group of contributors
* Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices