Thin-Film Diamond I: (part of the Semiconductors and Semimetals Series)

Nebel, Christopher; Ristein, Juergen

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Table of contents
  • Cover
  • Thin-Film Diamond Iiii
  • Copyright Pageiv
  • Contentsv
  • List of Contributorsxi
  • Prefacexiii
  • Chapter 1. Textured and Heteroepitaxial CVD Diamond Films1
  • 1. Introduction1
  • 2. Heteroepitaxy of Diamond on Different Substrate Materials2
  • 3. Nucleation of CVD Diamond Films6
  • 4. Interface and Grain Misorientation17
  • 5. Microstructure and Growth Phenomena of [001] Diamond Films26
  • 6. Textured Diamond Films33
  • 7. Summary and Conclusions42
  • Acknowledgements43
  • References43
  • Chapter 2. Structural Imperfections in CVD Diamond Films49
  • 1. Introduction49
  • 2. Structure and Morphology at Different Size Scales50
  • 3. Structural Imperfections at the Meso-Scale and the Atomic Size Scale68
  • 4. Epitaxy of Diamond Films119
  • 5. Concluding Remarks131
  • References133
  • Chapter 3. Doping Diamond by Ion-Implantation145
  • 1. Introduction145
  • 2. Ion-Implantation Related Damage in Diamond149
  • 3. Implantation/Annealing Schemes157
  • 4. Doping Diamond by Ion-Implantation162
  • 5. Conclusions178
  • Acknowledgements179
  • References179
  • Chapter 4. Boron Doping of Diamond Films from the Gas Phase183
  • 1. Introduction and Historical183
  • 2. Influence of the Deposition Technique and of the Deposition Conditions on the Quality of the Undo185
  • 3. Boron in Diamond Films190
  • 4. Infrared Absorption from Boron-doped Films200
  • 5. Raman Diffusion and B Content204
  • 6. Electrical Characteristics of Boron-doped Diamond Films210
  • 7. The Role of Boron Doping in Diamond Thin Films Applications225
  • 8. Summary and Conclusions227
  • Acknowledgements232
  • References232
  • Chapter 5. n-Type Diamond Growth239
  • 1. Introduction239
  • 2. Phosphorus-doped Diamond Growth240
  • 3. Electrical Properties of Phosphorus-doped Diamond Films248
  • 4. Luminescence Characteristics of Phosphorus-doped Diamond Thin Films251
  • 5. pn Junction (Koizumi, Watanabe, Hasegawa and Kanda, 2001, 2002)252
  • 6. Summary258
  • References258
  • Chapter 6. Transport and Defect Properties of Intrinsic and Boron-Doped Diamond261
  • 1. Introduction261
  • 2. Electronic Properties of CVD Diamond262
  • 3. Defect and Acceptor Properties of Boron-doped Diamond290
  • Acknowledgements319
  • References319
  • Chapter 7. Optical Properties of CVD Diamond325
  • 1. Introduction325
  • 2. Thin Film Optical Absorption Techniques327
  • 3. The Extrinsic Absorption in CVD Diamond based on Photoelectrical Techniques347
  • References373
  • Chapter 8. Luminescence from Optical Defects and Impurities in CVD Diamond379
  • 1. Introduction379
  • 2. Intrinsic Luminescence380
  • 3. Narrow-line Spectra from Optical Defects385
  • 4. Broad-band Luminescence407
  • 5. Acceptor- and Donor-related Luminescence: Bound Excitons and Line-resolved DAP Recombination422
  • References443
  • Index453
Book details
  • Vendor Elsevier S & T
  • SKU 9780127521855
  • ISBN-13 9780080541037
  • Author Nebel, Christopher; Ristein, Juergen
  • Category Technology & Engineering
  • Subject Materials Science

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This volume reviews the state of the art of thin film diamond, a very promising new semiconductor that may one day rival silicon as the material of choice for electronics. Diamond has the following important characteristics; it is resistant to radiation damage, chemically inert and biocompatible and it will become "the material" for bio-electronics, in-vivo applications, radiation detectors and high-frequency devices.

Thin-Film Diamond is the first book to summarize state of the art of CVD diamond in depth. It covers the most recent results regarding growth and structural properties, doping and defect characterization, hydrogen in and on diamond as well as surface properties in general, applications of diamond in electrochemistry, as detectors, and in surface acoustic wave devices.

· Accessible by both experts and non-experts in the field of semi-conductors research and technology, each chapter is written in a tutorial format
· Helping engineers to manufacture devices with optimized electronic properties
· Truly international, this volume contains chapters written by recognized experts representing academic and industrial institutions from Europe, Japan and the US